Comparative Investigation of Flat-Band Voltage Modulation by Nitrogen Plasma Treatment for Advanced HKMG Technology
2018
期刊
ECS Journal of Solid State Science and Technology
作者
Jiaxin Yao
· Huaxiang Yin
· Zhenhua Wu
· Jianfeng Gao
· Qingzhu Zhang
· Zhaozhao Hou
· Jie Gu
· Kun Luo
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- 卷 7
- 期 8
- 页码 Q152-Q158
- The Electrochemical Society
- ISSN: 2162-8769
- DOI: 10.1149/2.0221808jss