Kinetics of thermal annealing in strained ultrathin Si/Ge superlattices on vicinal Si(100) studied by Raman scattering - 太阳能&表面物理实验室 | LabXing

array(2) { ["lab"]=> string(3) "978" ["publication"]=> string(4) "7755" } Kinetics of thermal annealing in strained ultrathin Si/Ge superlattices on vicinal Si(100) studied by Raman scattering - 太阳能&表面物理实验室 | LabXing

太阳能&表面物理实验室

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Kinetics of thermal annealing in strained ultrathin Si/Ge superlattices on vicinal Si(100) studied by Raman scattering

1996

期刊 Journal of Applied Physics

作者 Zhenghao Chen · Xudong Xiao · Stanley Au · Junming Zhou · M. M. T. Loy

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卷 80
期 4
页码 2211-2215
AIP Publishing
ISSN: 0021-8979
DOI: 10.1063/1.363051

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