#Anping Huang

Comprehensive understanding of the effect of electric dipole at high-k/SiO2 interface on the flatband voltage shift in metal-oxide-semiconductor device

铁电器件课题组（王晓磊） , 中国科学院微电子研究所

Physical origin of dipole formation at high-k/SiO2 interface in metal-oxide-semiconductor device with high-k/metal gate structure

铁电器件课题组（王晓磊） , 中国科学院微电子研究所

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