array(2) { ["lab"]=> string(4) "1352" ["news"]=> string(3) "942" } 田凤彬博士的的IEEE TED文章发表 - 铁电器件课题组(王晓磊) | LabXing

田凤彬博士的的IEEE TED文章发表

恭喜田凤彬博士的文章“Impact of Interlayer and Ferroelectric Materials on Charge Trapping during Endurance Fatigue of FeFET with TiN/HfxZr1-xO2/interlayer/Si (MFIS) Gate Structure”发表在IEEE TED杂志上

创建: Nov 18, 2021 | 08:29